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STUDYING THE STRUCTURAL, OPTICAL, CHEMICAL AND ELECTROCHEMICAL ETCHING CHANGES OF CR-39 FOR DOSEMETRIC APPLICATIONS

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The present work shows the induced modification of the structural, optical, chemical etching and electrochemical etching parameters of CR-39 irradiated with alpha-particles. CR-39 polymer track detectors were irradiated with different… Click to show full abstract

The present work shows the induced modification of the structural, optical, chemical etching and electrochemical etching parameters of CR-39 irradiated with alpha-particles. CR-39 polymer track detectors were irradiated with different fluences (1.62 × 106, 2.72 × 106, 3.82 × 106 and 5.21 × 106 particles/cm2) of alpha-particles using 241Am source. The structural and optical properties were measured by FT-IR spectroscopy, X-ray diffraction and UV/Vis spectroscopy, respectively. The FT-IR spectra reveal that no major changes in the typical functional groups of irradiated polymer detectors. The X-ray diffraction patterns show that a broad band in the region of 12° < 2θ > 27°, which refers to the presence of the combination of amorphous and crystalline phases. UV/Vis responses of irradiated polymer track detectors exhibit a single absorption band in the range of 254-352 nm that is correlated to the occurrence of electronic transition. Also, the changes in the chemical and electrochemical parameters due to alpha-irradiation are examined and thoroughly discussed.

Keywords: structural optical; electrochemical etching; spectroscopy; chemical electrochemical; optical chemical

Journal Title: Radiation Protection Dosimetry
Year Published: 2017

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