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The van der Waals material CeOI is predicted to be a layered antiferromagnetic Mott insulator by DFT+U calculation. We successfully grow the CeOI films down to monolayer on graphene/6H-SiC(0001) substrate… Click to show full abstract
The van der Waals material CeOI is predicted to be a layered antiferromagnetic Mott insulator by DFT+U calculation. We successfully grow the CeOI films down to monolayer on graphene/6H-SiC(0001) substrate by using molecular beam epitaxy. Films are studied by {\it in-situ} scanning tunneling microscopy and spectroscopy, which shows a band gap of 4.4 eV. A metallic phase with composition unidentified also exists. This rare earth oxyhalide adds a new member to the two-dimensional magnetic materials.
Keywords:
epitaxial growth;
growth band;
antiferromagnetic mott;
mott insulator
Journal Title: Physical Review Materials
Year Published: 2020
Link to full text (if available)
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Journal Title: Physical Review Materials
Year Published: 2020
Link to full text (if available)
Share on Social Media: Sign Up to like & get
recommendations!