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This paper presents the required structure and function of a ring-FEL as a radiation source for extreme ultraviolet radiation lithography (EUVL). A 100 m-long straight section that conducts an extremely low… Click to show full abstract
This paper presents the required structure and function of a ring-FEL as a radiation source for extreme ultraviolet radiation lithography (EUVL). A 100 m-long straight section that conducts an extremely low emittance beam from a fourth-generation storage ring can increase the average power at 13.5 nm wavelength to up to 1 kW without degrading the beam in the rest of the ring. Here, simulation results for a ring-FEL as a EUVL source are described.
Keywords:
ring fel;
euv lithography;
lithography tool;
lithography;
fel euv;
demonstration ring
Journal Title: Journal of synchrotron radiation
Year Published: 2020
Link to full text (if available)
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Journal Title: Journal of synchrotron radiation
Year Published: 2020
Link to full text (if available)
Share on Social Media: Sign Up to like & get
recommendations!