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Numerical Study of a Thyristor Injection Insulated Gate Bipolar Transistor (TI-IGBT) Using P-N-P Collector

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A new thyristor injection concept is proposed to decrease conductivity modulation effects in an Insulated Gate Bipolar Transistor (TI-IGBT), which adds a floating p-type layer and an n-type layer at… Click to show full abstract

A new thyristor injection concept is proposed to decrease conductivity modulation effects in an Insulated Gate Bipolar Transistor (TI-IGBT), which adds a floating p-type layer and an n-type layer at the collector side. The additional p-layer and n-layer form a parasitic n-p-n transistor to reduce the hole injection efficiency though the potential difference between the floating p-type layer and the field stop (FS) layer, as well as decrease hole concentration near the collector, turn-OFF fall time and turn-OFF loss. TACD simulations shows, a 24% and a 10% reduction in turn-OFF fall time and turn-OFF loss are respectively obtained in the proposed TI-IGBT with the similar breakdown voltage and threshold voltage compared to a conventional FS-IGBT by the potential difference with the various floating p-layer doping. Therefore, the TI-IGBT offers a competitive option for high power converter applications.

Keywords: thyristor injection; injection; insulated gate; collector; layer; transistor

Journal Title: IEEE Journal of the Electron Devices Society
Year Published: 2019

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