This paper details a robust parameter extraction flow for the PSPHV LDMOS transistor model. The procedure uses a global scaling parameter set and accounts for self-heating. We describe how to… Click to show full abstract
This paper details a robust parameter extraction flow for the PSPHV LDMOS transistor model. The procedure uses a global scaling parameter set and accounts for self-heating. We describe how to determine parameters associated with important physical effects specific to PSPHV: non-uniform lateral channel doping; the Kirk effect; internal drain voltage clamping; and the drain expansion effect. The method is verified on devices from different technologies. Verilog-A code for PSPHV is publicly available.
               
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