Comprehensive characterization results of CMOS-microelectromechanical systems resonant pressure sensor are presented. We have extensively evaluated the key performance parameters of our device in terms of quality factor ( $Q$ )… Click to show full abstract
Comprehensive characterization results of CMOS-microelectromechanical systems resonant pressure sensor are presented. We have extensively evaluated the key performance parameters of our device in terms of quality factor ($Q$ ) variations under variable conditions of temperature and pressure, characterized by Knudsen number ($K_{n}$ ). The fundamental frequency of the reported device is 104.3 kHz. Over the full-scale pressure range of 0.1 to 100 kPa and a temperature range of −10 °C to 85 °C, $Q$ from 450 to 62.6 have been obtained. Besides, static variations of the device capacitance have been measured and analyzed with temperature to evaluate the spring softening and the pull-in effects. A nonlinearity analysis has been performed to assess the device stability. Furthermore, a statistical mismatch analysis has been carried out to determine the deviation of resonance with etching time and ascertain maximum device yield. With our in-house back-end of line metal-layer release, this sensor can be monolithically embedded in the same substrate as standard CMOS integrated circuits, resulting in a significant cost and area reduction.
