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Correlation Between Electromigration-Related Void Volumes and Time-to-Failure by High Resolution X-Ray Tomography and Modeling

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High resolution synchrotron tomography has demonstrated a proportionality between electromigration induced void volume and time-to-failure in hybrid bonding based test structures. A conventional failure by voiding in long feed lines… Click to show full abstract

High resolution synchrotron tomography has demonstrated a proportionality between electromigration induced void volume and time-to-failure in hybrid bonding based test structures. A conventional failure by voiding in long feed lines was observed. Process induced bonding voids do not affect reliability of the analyzed samples.

Keywords: high resolution; tomography; time failure; failure; electromigration

Journal Title: IEEE Electron Device Letters
Year Published: 2019

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