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Non-volatile (NV) nano-electro-mechanical (NEM) switches are successfully implemented using multiple metallic layers in a standard 65 nm CMOS back-end-of-line (BEOL) process with no additional lithography steps. Non-volatile operation of a… Click to show full abstract
Non-volatile (NV) nano-electro-mechanical (NEM) switches are successfully implemented using multiple metallic layers in a standard 65 nm CMOS back-end-of-line (BEOL) process with no additional lithography steps. Non-volatile operation of a NEM switch as a reconfigurable interconnect to dynamically change CMOS circuit functionality is demonstrated.
Keywords:
end line;
electro mechanical;
nano electro;
back end
Journal Title: IEEE Electron Device Letters
Year Published: 2020
Link to full text (if available)
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Journal Title: IEEE Electron Device Letters
Year Published: 2020
Link to full text (if available)
Share on Social Media: Sign Up to like & get
recommendations!