LAUSR

The objective of this letter oriented toward micro-wave measurement of high-impedance devices using a conventional on-wafer probe station is multiple. First, we provided a quantification of the measurement uncertainty inherent to the setup when measuring capacitors in the range of 0.01–10 fF using both the reflection and transmission methods up to 50 GHz. In particular, we demonstrate a clear improvement when using the transmission method in series-through configuration. As a practical demonstration, on-wafer MOS voltage-tunable capacitors with capacitances ranging from 0.85 to 1.15 fF are extracted with uncertainties of 130 and 2 aF, respectively, for both reflection and transmission measurements at 10 GHz. Capacitance fluctuation related to the technological process on the order of 20 aF is then exemplary demonstrated using the series-through configuration.