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This letter reports on an Echelle grating demultiplexer for dense wavelength-division-multiplexing applications with 16 channels and 100 GHz channel spacing. The Echelle grating is designed and fabricated on a silicon-on-insulator… Click to show full abstract
This letter reports on an Echelle grating demultiplexer for dense wavelength-division-multiplexing applications with 16 channels and 100 GHz channel spacing. The Echelle grating is designed and fabricated on a silicon-on-insulator platform with a silicon guiding layer of 300 nm. The measured insertion losses of the Echelle grating are lower than 2 dB for all channels and the crosstalk is below 15 dB. Error free transmission was obtained for all channels with negligible penalty.
Keywords:
silicon insulator;
echelle grating;
silicon;
100 ghz;
insulator platform;
wavelength
Journal Title: IEEE Photonics Technology Letters
Year Published: 2017
Link to full text (if available)
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Journal Title: IEEE Photonics Technology Letters
Year Published: 2017
Link to full text (if available)
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recommendations!