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Increase in the Efficiency of III-Nitride Micro-LEDs: Atomic-Layer Deposition and Etching

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MICRO-LEDs ( n-LEDs) HAVE been engaged in the next-generation display technology and evolved for various applications from several electronics manufacturers and institutions. The area of n-LEDs (less than 10 #… Click to show full abstract

MICRO-LEDs ( n-LEDs) HAVE been engaged in the next-generation display technology and evolved for various applications from several electronics manufacturers and institutions. The area of n-LEDs (less than 10 # 10 nm2) is desired for the high pixelsper-inch (PPI) value of the microdisplay, but the sidewall effect from the etching process will drop the quantum efficiency

Keywords: micro leds; increase efficiency; efficiency iii; nitride micro; efficiency; iii nitride

Journal Title: IEEE Nanotechnology Magazine
Year Published: 2021

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