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Investigation of Quantization Effects on RTS Due to Oxide Traps Induced by Channel Hot-Carrier-Stressing in pMOSFETs

Although it is the worst degradation mechanism, the effect of channel hot carrier (CHC) stressing on random telegraph signals (RTS) has not been given enough attention in pMOSFETs. We report… Click to show full abstract

Although it is the worst degradation mechanism, the effect of channel hot carrier (CHC) stressing on random telegraph signals (RTS) has not been given enough attention in pMOSFETs. We report on the effect of CHC stressing on different RTS trap parameters namely screened scattering coefficient which controls the amount of charge carrier mobility fluctuations due to remote Coulomb scattering by the trap, RTS fluctuation amplitude, average capture time and capture cross-section. The generation of positive fixed oxide charge with stressing influences the screened Coulomb scattering of the channel carriers and therefore their mobility, in addition to the commonly accepted self-screening of the channel carriers. The two-dimensional mobility fluctuations model is adopted for analyzing the CHC effect on pMOSFETs. The comparison between theoretically and experimentally obtained screened scattering coefficients points toward the impact of the newly generated positive fixed oxide charge due to stressing. The decrease of the screened scattering coefficient results in increased RTS amplitude and decreased contribution of mobility fluctuations to RTS amplitude. Capture time and capture cross-section also change as the capture cross-section pre-factor has been impacted by the reduction of relaxation energy with stressing.

Keywords: mobility; screened scattering; hot carrier; capture; channel hot; carrier

Journal Title: IEEE Transactions on Device and Materials Reliability
Year Published: 2020

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