LAUSR.org creates dashboard-style pages of related content for over 1.5 million academic articles. Sign Up to like articles & get recommendations!

Step JTE, an Edge Termination for UHV SiC Power Devices With Increased Tolerances to JTE Dose and Surface Charges

Photo by saadahmad_umn from unsplash

An edge termination method, referred to as guard-ring-assisted multistep junction termination extension (MS-GR-JTE), is presented for ultrahigh voltage silicon carbide (SiC) power devices. In comparisonwith other JTEs, the MS-GR-JTE creates… Click to show full abstract

An edge termination method, referred to as guard-ring-assisted multistep junction termination extension (MS-GR-JTE), is presented for ultrahigh voltage silicon carbide (SiC) power devices. In comparisonwith other JTEs, the MS-GR-JTE creates a step electric field (EF) distribution with greatly reduced peak EF at the corners and edges of the device, resulting in a superior breakdown voltage (BV) performance with wide tolerances to JTE dose and SiC surface charges. According to the numerical simulations based on a 100- $\mu \text{m}$ -thick epilayer, an optimized MS-GR-JTE shows that the 15-kV BV performance with wide tolerances of $1.3\times 10^{12}$ cm $^{-2}$ to JTE dose and $6.1\times 10^{12}$ cm $^{-2}$ to positive surface charges are obtained, respectively, both superior to other compared JTEs.

Keywords: jte; tex math; inline formula

Journal Title: IEEE Transactions on Electron Devices
Year Published: 2017

Link to full text (if available)


Share on Social Media:                               Sign Up to like & get
recommendations!

Related content

More Information              News              Social Media              Video              Recommended



                Click one of the above tabs to view related content.