LAUSR

Measured single-event (SE) heavy-ion data for comparable silicon on insulator (SOI) and bulk silicon FinFET D flip-flop (DFF) designs demonstrate a notably greater difference between the SOI and bulk responses, which has commonly been observed. Data show greater than $30\times $ in SE upset (SEU) LET threshold and 3 orders of magnitude decrease in saturated SE cross section for SOI FinFETs when compared to bulk FinFETs. The difference in SEU threshold is shown to be due to the saturation of SE transient (SET) pulsewidths at values that are comparable to feedback-loop delays of DFF design in the SOI technology. The feedback-loop delays in FinFET technologies are significantly impacted by the inherent parasitic capacitance. For the bulk technology, SET pulsewidths do not saturate due to charge collection from the substrate region.