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Effect of ultrathin Fe dusting layer on electrical transport properties of few-layer MoS2 field-effect transistors

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Transition-metal-doped MoS2 has been predicted to be a potential candidate for a two dimensional dilute magnetic semiconductor, while the effect of transition metal dopants on the electrical properties of MoS2-based… Click to show full abstract

Transition-metal-doped MoS2 has been predicted to be a potential candidate for a two dimensional dilute magnetic semiconductor, while the effect of transition metal dopants on the electrical properties of MoS2-based devices has received relatively less attention so far. Here, the authors report on a systematic electrical transport study of Fe-dusted few-layer molybdenum disulfide (MoS2) field-effect transistors via repeated in situ Fe deposition (total nominal thickness ≤ 2 nm) and electrical measurements in ultrahigh vacuum. It is found that an ultrathin Fe adsorption layer (≪0.5 nm) n-dopes MoS2 without noticeably affecting the electrical characteristics of the device. In contrast, a thicker Fe layer (0.5–2 nm) results in the loss of the carrier tunability and a nonlinear current-voltage characteristic with the differential conductance approximately linear to drain voltage. The authors show through result analysis and qualitative modeling that Fermi level pinning in MoS2 directly underneath Fe nanoclust...

Keywords: electrical transport; field effect; effect; effect transistors; mos2 field

Journal Title: Journal of Vacuum Science and Technology
Year Published: 2017

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