Abstract. The development of methods for in situ analysis is required to provide deeper understanding of carbon film materials formation during chemical vapor deposition (CVD). Here, we describe scanning probe… Click to show full abstract
Abstract. The development of methods for in situ analysis is required to provide deeper understanding of carbon film materials formation during chemical vapor deposition (CVD). Here, we describe scanning probe microscope instrument designed for study of nucleation and growth of thin film materials obtained by carbon condensation from a hydrogen/methane gas mixture activated by the “hot filament” method. The microscope allows measurements of topology characteristics, width of band gap, Fermi level position, and electrical conductivity of the carbon film material during its formation in the CVD process. We present the design and the characteristics of the microscope in this paper.
               
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