Abstract. Scanning beam interference lithography (SBIL) is an advanced technology developed for manufacturing large-area diffraction grating at a nanometer-scale phase accuracy. To withstand environmental disturbances and maintain the interference fringes… Click to show full abstract
Abstract. Scanning beam interference lithography (SBIL) is an advanced technology developed for manufacturing large-area diffraction grating at a nanometer-scale phase accuracy. To withstand environmental disturbances and maintain the interference fringes still relative to the substrate, SBIL requires high-precision phase control. We proposed a fringe phase control system with homodyne detection for SBIL. First, a homodyne detector is employed to achieve high-precision phase measurement, while ensuring the simplicity of the optics and high laser utilization. The time-varying nonlinear error in the measurement results is corrected by a dynamic ellipse fitting method. To reduce the latency effect, a lead controller is designed using the root locus method based on the model identification result. The lead controller considerably increases the control bandwidth while ensuring a sufficient phase margin, which further suppresses disturbances and stabilizes the interference fringes to within ∼1 / 60 of the fringe period. Wide-range phase tracking for perpendicular scanning with high accuracy is also verified through an experiment.
               
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