LAUSR

A new strategy for the synthesis of fluorene-containing polyphenols of porphyrin series by the Suzuki–Miyaura reaction of hexabromoporphyrin and monoboryl derivative of substituted fluorene has been proposed. Several sequential chemical transformations of the prepared porphyrin allowed preparation of polyphenol derivative of the noted compound. Similar polyphenol has been used as a basis for the design of positive photoresists for nanolithography with 13.5-nm exposing radiation, which can produce topological structures with resolution 22–16 nm.