TiO2 thin films were deposited on quartz substrate by RF-magnetron sputtering technique. The effect of varying oxygen fraction f(O2) = (O2/(Ar + O2) on the surface morphology, structure, electrical... Click to show full abstract
TiO2 thin films were deposited on quartz substrate by RF-magnetron sputtering technique. The effect of varying oxygen fraction f(O2) = (O2/(Ar + O2) on the surface morphology, structure, electrical...
               
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