Photo from wikipedia
Modification of indium sulfide (In2S3) film surface was performed by the treatment in high-density low-pressure inductively coupled argon plasma. The films with thickness of 500–800[Formula: see text]nm were fabricated on… Click to show full abstract
Modification of indium sulfide (In2S3) film surface was performed by the treatment in high-density low-pressure inductively coupled argon plasma. The films with thickness of 500–800[Formula: see text]nm were fabricated on glass substrates by the thermal evaporation method and subsequent annealing in sulfur ambience. The plasma treatment of as-grown and annealed films was carried out with argon ions having the energy of 25–200[Formula: see text]eV. Nanostructuring of the film surface took place resulting in the formation of arrays of nanosized indium droplets.
Journal Title: International Journal of Nanoscience
Year Published: 2019
Link to full text (if available)
Share on Social Media: Sign Up to like & get
recommendations!