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A quick cleaning process was developed for a silicon carbide chemical vapor deposition reactor. For this purpose, the stability of the susceptor coating film made of pyrolytic carbon was evaluated… Click to show full abstract
A quick cleaning process was developed for a silicon carbide chemical vapor deposition reactor. For this purpose, the stability of the susceptor coating film made of pyrolytic carbon was evaluated by means of exposing it to 100% chlorine trifluoride gas for 10 min at various temperatures. The origin...
Keywords:
carbide chemical;
silicon carbide;
chemical vapor;
vapor deposition;
quick cleaning;
cleaning process
Journal Title: ECS Journal of Solid State Science and Technology
Year Published: 2017
Link to full text (if available)
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Journal Title: ECS Journal of Solid State Science and Technology
Year Published: 2017
Link to full text (if available)
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recommendations!