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This work proposed a modified plasma induced charging (PID) detector to widen the detection range, for monitoring the possible plasma damage across a wafer during advanced CMOS BEOL processes. New… Click to show full abstract
This work proposed a modified plasma induced charging (PID) detector to widen the detection range, for monitoring the possible plasma damage across a wafer during advanced CMOS BEOL processes. New antenna designs for plasma induced damage patterns with extended capacitors are investigated. By adapting the novel PID detectors, the maximum charging levels of the detectors have been enhanced.
Keywords:
beol processes;
plasma;
plasma induced;
advanced cmos;
induced charging;
cmos beol
Journal Title: Nanoscale Research Letters
Year Published: 2021
Link to full text (if available)
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Journal Title: Nanoscale Research Letters
Year Published: 2021
Link to full text (if available)
Share on Social Media: Sign Up to like & get
recommendations!