Planetary substrate rotation for optical-coating deposition is evaluated based on initial and final positions for a given layer with different numbers of revolutions and various deposition-source locations. The influence of… Click to show full abstract
Planetary substrate rotation for optical-coating deposition is evaluated based on initial and final positions for a given layer with different numbers of revolutions and various deposition-source locations. The influence of partial revolutions of the rotation system is analyzed relative to the total number of planetary revolutions in that layer to determine the relative impact on film thickness and uniformity. Guidance is provided on the necessary planetary revolutions that should take place in each layer versus the expected error level in the layer thickness for the modeled system.
               
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