LAUSR

We report the influence of polarization on the damage mechanism of oxide thin films submitted to multiple pulses in the sub-picosecond regime. We have exposed single layer coatings of oxide materials and multilayer stacks (mirrors) to multiple laser pulses at 1030nm, 500fs, and the events on the tested sample sites were recorded in situ with high resolution microscopy. For multiple shots while keeping the fluence below the single shot threshold, damage on the film begins to form and for some of the samples the damage growth follows polarization dependent patterns. This damage growth was investigated and our results match with the assumption that the existence of nano-defects contributes to the early stage of the formation of damage, in which the energy absorption in a defect site causes local nanoablation at a laser fluence under the intrinsic ablation threshold and nanovoid formation. Based on the simulation of the interference of the scattered wave by the nanovoid with the incident wave, we obtain good correlation between simulated and observed damage growth behavior. This process leads to the formation of specific damage morphology that is strongly dependent on the polarization of the incident wave.