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We demonstrate millimeters-long VCSEL linear arrays with SU-8 epoxy-based microlenses that are directly patterned and cross-linked on the output apertures by a simple, photoacid-diffusion-aided photolithography technique. The linear arrays are… Click to show full abstract
We demonstrate millimeters-long VCSEL linear arrays with SU-8 epoxy-based microlenses that are directly patterned and cross-linked on the output apertures by a simple, photoacid-diffusion-aided photolithography technique. The linear arrays are capable of delivering >7 W of peak pulsed output power. By exploiting the photoacid diffusion effect, it is possible to produce a range of microlens structures with height and radius of curvature ranging from approximately ten to tens of microns. Simulation and experimental results show that the far-field beam divergence can be reduced by a factor of up to 7 in VCSELs integrated with optimal microlens dimensions.
Journal Title: Optics express
Year Published: 2020
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