LAUSR

Recently, light absorbers have attracted great attentions due to their promising in applications in functional optoelectronic devices. Herein, we theoretically propose and numerically demonstrate a new absorber platform, which consists of a 280-nm-thick photonic nonlinear waveguide film covering on the metal grating structure. Strong reflection inhibition and absorption enhancement is achieved in both the forward and backward directions, which indicates potential novel performances since the previous reports only achieved absorption in one side due to the using of opaque metal film substrate or the reflective mirror. The anti-reflection bands or the absorption peaks at the shorter and longer wavelength ranges are related to the excitation of the propagating surface plasmon resonance by the slit-assisted grating and the cavity mode by the slit in the metal film. Strong differential manipulation is realized for the double-face absorbers via the all-optical operation. Moreover, the operation wavelengths for the double-face light absorber can be modified strongly via using an asymmetric dielectric medium for the coating films. These new findings pave approaches for subtractive lightwave modulation technology, selective filtering, multiplex sensing and detection, etc.