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We proposed a fabrication method for silicon nanospheres with diameters of 100-200 nm at arbitrary locations by using electron-beam lithography and hydrogen annealing. The nanospheres showed a strong magnetic field… Click to show full abstract
We proposed a fabrication method for silicon nanospheres with diameters of 100-200 nm at arbitrary locations by using electron-beam lithography and hydrogen annealing. The nanospheres showed a strong magnetic field response in the visible region that was observed as scattered light emitted from the nanospheres. The scattering spectra were calculated by finite-difference time-domain simulation. Periodically arranged silicon nanospheres were successfully fabricated as designed, and the scattered light was measured by dark-field illumination microscopy. The scattering spectra were in the visible range, and the peak position was redshifted as the diameter increased.
Journal Title: Optical Materials Express
Year Published: 2021
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