LAUSR.org creates dashboard-style pages of related content for over 1.5 million academic articles. Sign Up to like articles & get recommendations!

Fabrication of a rutile titanium dioxide thin film heterostructure using ion-implantation with Cu-Sn bonding

Photo by seemurray from unsplash

Single crystalline titanium dioxide thin film in the rutile phase (r-TiO2) is exfoliated from bulk material using a He+-implantation method, and is bonded onto SiO2 substrate to form a heterostructure… Click to show full abstract

Single crystalline titanium dioxide thin film in the rutile phase (r-TiO2) is exfoliated from bulk material using a He+-implantation method, and is bonded onto SiO2 substrate to form a heterostructure using Cu-Sn bonding technology. The exfoliated r-TiO2 thin film was examined to be in good quality, and the exfoliation mechanism of ion-implanted r-TiO2 was analyzed. The obtained r-TiO2 thin film heterostructure with high refractive index contrast has a potential application in the fabrication of high-Q optical microcavities in visible wavelengths, which is useful in integrated photonic devices.

Keywords: thin film; heterostructure using; dioxide thin; titanium dioxide; film

Journal Title: Optical Materials Express
Year Published: 2021

Link to full text (if available)


Share on Social Media:                               Sign Up to like & get
recommendations!

Related content

More Information              News              Social Media              Video              Recommended



                Click one of the above tabs to view related content.