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Fabrication of p-type Transparent (CuZn)O Thin Films by the Electrochemical Deposition Method

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Copper zinc oxide (CuZn)O thin films were fabricated on indium tin oxide-coated glass substrates using the cathodic electrochemical deposition method under various conditions. These included different temperatures, deposition times, and… Click to show full abstract

Copper zinc oxide (CuZn)O thin films were fabricated on indium tin oxide-coated glass substrates using the cathodic electrochemical deposition method under various conditions. These included different temperatures, deposition times, and potentials. The deposition solution contained 1 mM Cu(NO3)2 and various concentrations of Zn(NO3)2. X-ray diffraction demonstrated that wurtzite structure for films deposited at 60°C, whereas samples that deposited at room temperature were amorphous. In the visible region, the samples exhibited high optical transmission, i.e., larger than 65%. Conductivity was found to be p-type by photoelectrochemical characterizations for the samples fabricated at room temperature. In contrast, the films fabricated at 60°C were n-type or close to intrinsic.

Keywords: thin films; deposition method; cuzn thin; electrochemical deposition; deposition

Journal Title: International Journal of Electrochemical Science
Year Published: 2020

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