LAUSR

INTRODUCTION The Cylindrical Surrounding Double-Gate MOSFET has been designed using Aluminium Gallium Arsenide in its arbitrary alloy form alongside Indium Phosphide with Lanthanum Dioxide as a high-ƙ dielectric material. METHOD The heterostructure based on the AlxGa1-xAs/InP: Pt has been used in the design and implementation of the MOSFET for RF applications. Platinum serves as the gate material, which has higher electronic immunity toward the Short Channel Effect and highlights semiconductor properties. The charge buildup is the main concern in the field of MOSFET design when two different materials are considered for fabrication. The usage of 2 Dimensional Electron Gas has been outstanding in recent years to help the electron buildup and charge carrier accumulation in the MOSFETs regime. Device simulation used for the smart integral systems is an electronic simulator that uses the physical robustness and the mathematical modeling of semiconductor heterostructures. In this research work, the fabrication method of Cylindrical Surrounding Double Gate MOSFET has been discussed and realized. The scaling down of the devices is essential to reduce the area of the chip and heat generation. By using these cylindrical structures, the area of contact with the circuit platform is reduced since the cylinder can be laid down horizontally. RESULT The coulomb scattering rate is observed to be 18.3 % lower than the drain terminal when compared to the source terminal. Also, at x = 0.125 nm, the rate is 23.9 %, which makes it the lowest along the length of the channel; at x = 1 nm, the rate is 1.4 % lesser than that of the drain terminal. A 1.4 A/mm2 high current density had been achieved in the channel of the device, which is significantly larger than comparable transistors. CONCLUSION The conventional transistor occupies a larger area than the proposed cylindrical structures transistor and is also efficient in RF applications.