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Growth and Electrical Properties of Epitaxial ZnO Films Prepared by Chemical Bath Deposition Using a Flow Reactor

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Prepared by Chemical Bath Deposition Using a Flow Reactor Author(s) Miyake, Masao; Yamamoto, Ken; Ikenoue, Takumi; Hirato, Tetsuji Citation Materials Transactions (2018), 59(11): 1761-1766 Issue Date 2018-11-01 URL http://hdl.handle.net/2433/237647 Right… Click to show full abstract

Prepared by Chemical Bath Deposition Using a Flow Reactor Author(s) Miyake, Masao; Yamamoto, Ken; Ikenoue, Takumi; Hirato, Tetsuji Citation Materials Transactions (2018), 59(11): 1761-1766 Issue Date 2018-11-01 URL http://hdl.handle.net/2433/237647 Right © 2018 The Japan Institute of Metals and Materials; Publisher permitted to deposit this paper on this repository. 発行元の許 可を得て登録しています. Type Journal Article Textversion publisher

Keywords: prepared chemical; deposition using; using flow; chemical bath; bath deposition; flow reactor

Journal Title: MATERIALS TRANSACTIONS
Year Published: 2018

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