Recent research in the field of formation of a 3D profile of optical elements with the use of direct laser writing at various wavelengths and photolithographic technologies on the basis… Click to show full abstract
Recent research in the field of formation of a 3D profile of optical elements with the use of direct laser writing at various wavelengths and photolithographic technologies on the basis of photomasks fabricated by means of laser writing is reviewed. Typical characteristics of the relief, as well as advantages and drawbacks of the above-mentioned methods are considered.
               
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