Dwarf bamboo (Fargesia denudata) is a staple food for the endangered giant pandas and plays a critical role in the sub-alpine ecosystem. Characterized by shallow roots and expeditious growth, it… Click to show full abstract
Dwarf bamboo (Fargesia denudata) is a staple food for the endangered giant pandas and plays a critical role in the sub-alpine ecosystem. Characterized by shallow roots and expeditious growth, it is exceedingly susceptible to drought stress and nitrogen (N) deposition in the context of a changing global environment. However, a comprehensive picture about the interactive response mechanism of dwarf bamboo to the two factors, water regime and N deposition, is far from being given. Therefore, a completely randomized design with two factors of water regimes (well-watered and water-stressed) and N deposition levels (with and without N addition) of F. denudata was conducted. In view of the obtained results, drought stress had an adverse impact on F. denudata, showing that it destroyed ultrastructure integrity and induced oxidative damage and restricted water status in leaves and roots, as well as declined photosynthetic efficiency in leaves, especially in N non-deposition plants. Nevertheless, F. denudata significantly increased heat dissipation in leaves, regulated antioxidant enzymes activities, antioxidants contents, and osmoregulation substances concentrations in leaves and roots, as well as shifted biomass partitioning in response to drought stress. However, regardless of water availability, N deposition maintained better ultrastructure in leaves and roots, resulting in superior photosynthesis and growth of F. denudata. Additionally, although N deposition did not cause oxidative damage in well-watered plants, ameliorated the effects of drought stress on F. denudata through co-deploying heat dissipation in leaves, the antioxidant system in roots as well as osmotic adjustment in leaves and roots. Noticeably, the leaves and roots of F. denudata expressed quite distinct acclimation responses to drought resistance under N deposition.
               
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