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In Plasma Catalytic Oxidation of Toluene Using Monolith CuO Foam as a Catalyst in a Wedged High Voltage Electrode Dielectric Barrier Discharge Reactor: Influence of Reaction Parameters and Byproduct Control

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Volatile organic compounds (VOCs) emission from anthropogenic sources has becoming increasingly serious in recent decades owing to the substantial contribution to haze formation and adverse health impact. To tackle this… Click to show full abstract

Volatile organic compounds (VOCs) emission from anthropogenic sources has becoming increasingly serious in recent decades owing to the substantial contribution to haze formation and adverse health impact. To tackle this issue, various physical and chemical techniques are applied to eliminate VOC emissions so as to reduce atmospheric pollution. Among these methods, non-thermal plasma (NTP) is receiving increasing attention for the higher removal efficiency, non-selectivity, and moderate operation, whereas the unwanted producing of NO2 and O3 remains important drawback. In this study, a dielectric barrier discharge (DBD) reactor with wedged high voltage electrode coupled CuO foam in an in plasma catalytic (IPC) system was developed to remove toluene as the target VOC. The monolith CuO foam exhibits advantages of easy installation and controllable of IPC length. The influencing factors of IPC reaction were studied. Results showed stronger and more stable plasma discharge in the presence of CuO foam in DBD reactor. Enhanced performance was observed in IPC reaction for both of toluene conversion rate and CO2 selectivity compared to the sole NTP process at the same input energy. The longer the contributed IPC length, the higher the toluene removal efficiency. The toluene degradation mechanism under IPC condition was speculated. The producing of NO2 and O3 under IPC process were effectively removed using Na2SO3 bubble absorption.

Keywords: toluene; discharge; cuo foam; plasma

Journal Title: International Journal of Environmental Research and Public Health
Year Published: 2019

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