In view of the demand for high-quality thermal neutron detectors, boron films have recently attracted widespread research interest because of their special properties. In this work, we report on the… Click to show full abstract
In view of the demand for high-quality thermal neutron detectors, boron films have recently attracted widespread research interest because of their special properties. In this work, we report on the deposition of boron films on silicon substrates by sub-picosecond pulsed laser deposition (PLD) at room temperature. Particular emphasis was placed on the investigation of the effect of the laser energy density (fluence) on the ablation process of the target material, as well as on the morphological properties of the resulting films. In addition, based on the study of the ablation and deposition rates as a function of the fluence, the ablation/deposition mechanisms are discussed. We show that well-adherent and stable boron films, with good quality surfaces revealing a good surface flatness and absence of cracks, can be obtained by means of the PLD technique, which proves to be a reliable and reproducible method for the fabrication of thick boron coatings that are suitable for neutron detection technology.
               
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