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Published in 2024 at "Advanced Electronic Materials"
DOI: 10.1002/aelm.202400342
Abstract: In this work, the out‐diffusion and uphill‐diffusion of Mg inside (100) β‐Ga2O3 epilayers and substrates are reported. The Mg accumulates toward the (100) surface upon annealing under an oxidizing environment, whereas the concentration profile changes…
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Keywords:
czochralski grown;
diffusion uphill;
100 ga2o3;
diffusion czochralski ... See more keywords
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Published in 2018 at "AIP Advances"
DOI: 10.1063/1.5031183
Abstract: In this letter, MOS capacitors with bilayer dielectrics consisted of large bandgap Al2O3 and high-k HfO2 in different stacking order on n-type doped (100) β-Ga2O3 are investigated through C − V and J − V…
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Keywords:
hfo2 al2o3;
ga2o3;
gate;
hfo2 ... See more keywords
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Published in 2024 at "Applied Physics Letters"
DOI: 10.1063/5.0226675
Abstract: β-(ScxGa1−x)2O3 (x = 0–0.36) thin films were epitaxially grown on (100) β-Ga2O3 substrates by oxygen-radical-assisted pulsed-laser deposition. β-(ScxGa1−x)2O3 epilayers were coherently strained up to x = 0.30, although the presence of a structural disorder was implied when x > 0.2. The…
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Keywords:
spectroscopy;
grown 100;
thin films;
100 ga2o3 ... See more keywords
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Published in 2024 at "Semiconductor Science and Technology"
DOI: 10.1088/1361-6641/ad22fe
Abstract: We report the effect of HfO2 passivation on the electrical characteristics of (100) β-Ga2O3 metal-oxide-semiconductor field-effect transistors (MOSFETs). The atomic-layer-deposited HfO2 layer with negative defect charges enhances the transconductance and subthreshold slope. A significant positive…
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Keywords:
layer;
atomic layer;
100 ga2o3;
surface ... See more keywords