Response of the Dielectric Parameters of (110)SrTiO3 Films to the Formation of Ferroelectric Domains in Their Volume
Sign Up to like & getrecommendations! Published in 2019 at "Physics of the Solid State"
DOI: 10.1134/s1063783419080092
Abstract: Three-layer SrRuO3/SrTiO3/SrRuO3 heterostructures were grown by laser evaporation on (110)LaAlO3 substrates. Photolithography and ion etching are used to form plane-parallel film capacitors, in which a layer of strontium titanate is placed between two film electrodes… read more here.
Keywords: films formation; srtio3 films; parameters 110; 110 srtio3 ... See more keywords