Electrochemical nanoimprint lithography directly on n-type crystalline silicon (111) wafer
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DOI: 10.1016/j.elecom.2016.12.004
Abstract: Abstract Here we report spontaneous redox reactions at the Pt/Si/electrolyte three-phase interface and propose an electrochemical method for nanoimprint lithography on a crystalline Si wafer that does not require thermoplastic and photocuring resists. When the… read more here.
Keywords: nanoimprint lithography; interface; wafer; 111 wafer ... See more keywords