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Published in 2019 at "Materials Science in Semiconductor Processing"
DOI: 10.1016/j.mssp.2019.104587
Abstract: Abstract The I-V and C-V measurements have been performed on the Al/YMn0.90Os0.10O3 (YMOO) /p-Si/Al metal/ferroelectric material/semiconductor (MFES) structure at temperatures between 180 K and 320 K. YMOO thin film has been grown onto p-Si wafer by radio…
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Keywords:
90os0 10o3;
current capacitance;
temperature;
value ... See more keywords