The Tailored Material Removal Distribution on Polyimide Membrane Can Be Obtained by Introducing Additional Electrodes
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DOI: 10.3390/polym15102394
Abstract: Reactive ion etching (RIE) is a promising material removal method for processing membrane diffractive optical elements and fabrication of meter-scale aperture optical substrates because of its high-efficiency parallel processing and low surface damage. However, the… read more here.
Keywords: additional electrodes; material removal; removal distribution; membrane ... See more keywords