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Published in 2021 at "Applied Surface Science"
DOI: 10.1016/j.apsusc.2021.150481
Abstract: Abstract In the measurement of critical dimension (CD) by scanning electron microscopy (SEM) and atomic force microscopy (AFM), the measured linewidths of the CD patterns are different from the real values due to the edge…
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Keywords:
afm sem;
microscopy;
magnification;
measurement critical ... See more keywords