Afterglow dynamics of plasma potential in bipolar HiPIMS discharges
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DOI: 10.1088/1361-6595/ac2aed
Abstract: In bipolar magnetron sputtering, the plasma afterglow is initiated by switching the target bias from a negative to positive voltage. In the following, the plasma potential evolution in this configuration is characterized, being responsible for… read more here.
Keywords: drop rise; plasma potential; afterglow dynamics; hipims discharges ... See more keywords