High chemical resistance and Raman enhancement in Ag/Al2O3 core-shell plasmonic nanostructures tailored by atomic layer deposition
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DOI: 10.1016/j.matchemphys.2018.11.009
Abstract: Abstract Atomic layer deposition (ALD) is a powerful technique with the capabilities of conformal deposition and precise thickness control of thin films up to atomic level. In this study, the advantages of ALD are exploited… read more here.
Keywords: al2o3 core; plasmonic nanostructures; shell plasmonic; shell ... See more keywords