Moisture barrier properties of low-temperature atomic layer deposited Al2O3 using various oxidants
Sign Up to like & getrecommendations! Published in 2019 at "Ceramics International"
DOI: 10.1016/j.ceramint.2019.06.156
Abstract: Abstract In this study, the growth characteristics and film properties of the atomic layer deposition (ALD) of Al2O3 are systemically identified using various oxidants (i.e., H2O, H2O2, CH3COOH, and O3). Among these reactants, ALD Al2O3… read more here.
Keywords: various oxidants; ald al2o3; temperature; low temperature ... See more keywords
Plasma-induced damage and annealing repairing in ALD-Al2O3/PECVD-SiNx stacks
Sign Up to like & getrecommendations! Published in 2019 at "Materials Science in Semiconductor Processing"
DOI: 10.1016/j.mssp.2019.05.010
Abstract: Abstract We study the effect of plasma-enhanced chemical vapor deposition (PECVD) SiNx process to atomic layer deposited (ALD) Al2O3 films on crystalline silicon surface passivation. The plasma-induced damage on Al2O3 films is affected by the… read more here.
Keywords: plasma induced; pecvd sinx; ald al2o3; al2o3 films ... See more keywords
Chemically Stable Atomic-Layer-Deposited Al2O3 Films for Processability
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DOI: 10.1021/acsomega.7b00443
Abstract: Atomic-layer-deposited alumina (ALD Al2O3) can be utilized for passivation, structural, and functional purposes in electronics. In all cases, the deposited film is usually expected to maintain chemical stability over the lifetime of the device or… read more here.
Keywords: microscopy; layer; atomic layer; layer deposited ... See more keywords
Characterization and prevention of humidity related degradation of atomic layer deposited Al2O3
Sign Up to like & getrecommendations! Published in 2017 at "Journal of Applied Physics"
DOI: 10.1063/1.4973583
Abstract: Atomic layer deposited aluminum oxide (ALD-Al2O3) is a dielectric material, which is widely used in organic light emitting diodes in order to prevent their organic layers from humidity related degradation. Unfortunately, there are strong hints… read more here.
Keywords: humidity related; degradation; related degradation; atomic layer ... See more keywords
Interfaces Between CdTe and ALD Al2O3
Sign Up to like & getrecommendations! Published in 2018 at "IEEE Journal of Photovoltaics"
DOI: 10.1109/jphotov.2018.2870139
Abstract: We present a combination of X-ray photoelectron spectroscopy (XPS) and time-resolved photoluminescence (TRPL) to probe the details of interface formation between CdTe and alumina deposited by atomic layer deposition (ALD). Alumina ALD using water as… read more here.
Keywords: interfaces cdte; al2o3; spectroscopy; cdte ald ... See more keywords