Thermal Conductivity and Thermal Boundary Resistances of ALD Al$$_{2}$$2O$$_{3}$$3 Films on Si and Sapphire
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DOI: 10.1007/s10765-017-2308-5
Abstract: On Si and sapphire substrates, 6–45 nm thick films of atomic layer-deposited Al$$_{2}$$2O$$_{3}$$3 were grown. The thermal conductivity of ALD films has been determined from a linear relation between film thickness and thermal resistance measured… read more here.
Keywords: thermal boundary; thermal conductivity; resistance; ald films ... See more keywords