Articles with "aln alscn" as a keyword



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Characterization of AlN and AlScN film ICP etching for micro/nano fabrication

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Published in 2021 at "Microelectronic Engineering"

DOI: 10.1016/j.mee.2021.111530

Abstract: Abstract We investigate the inductively coupled plasma (ICP) etching characteristics of (0002) Aluminum Nitride (AlN) and Aluminum Scandium Nitride (Al0.94Sc0.06N) piezoelectric thin films as well as the implementation on piezoelectric lamb wave resonators. A profile… read more here.

Keywords: icp etching; aln alscn; characterization aln; alscn film ... See more keywords