Low temperature growth of amorphous VO2 films on flexible polyimide substrates with a TiO2 buffer layer
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DOI: 10.1116/1.5019388
Abstract: Amorphous VO2 thin films were grown on anatase TiO2-buffered polyimide (PI) films using radio-frequency magnetron sputtering deposition with a VO2 target as low as at 175 °C. For comparison, the authors grew VO2 films on TiO2-buffered… read more here.
Keywords: vo2 films; microscopy; films grown; spectroscopy ... See more keywords