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Published in 2019 at "Applied Physics Letters"
DOI: 10.1063/1.5100075
Abstract: In this letter, we report analog switching characteristics in an analog resistive random access memory device based on a TiW/Al2O3/Ta2O5/Ta stack. For this device, both oxides were grown by using an atomic layer deposition system…
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Keywords:
al2o3 ta2o5;
switching characteristics;
analog switching;
tiw al2o3 ... See more keywords
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Published in 2022 at "Materials"
DOI: 10.3390/ma15248858
Abstract: In this work, the sputtered deposited WOx/TaOx switching layer has been studied for resistive random-access memory (RRAM) devices. Gradual SET and RESET behaviors with reliable device-to-device variability were obtained with DC voltage sweep cycling without…
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Keywords:
wox taox;
forming free;
analog switching;
tunable analog ... See more keywords