Surface analysis in the semiconductor industry: Present use and future possibilities
Sign Up to like & getrecommendations! Published in 2020 at "Surface and Interface Analysis"
DOI: 10.1002/sia.6766
Abstract: Secondary ion mass spectrometry (SIMS), X‐ray photoelectron spectroscopy (XPS), and atomic force microscopy (AFM) represent three surface analysis techniques heavily used in the complementary metal oxide semiconductor (CMOS) industry. The maturity of these techniques is… read more here.
Keywords: analysis; surface analysis; microscopy; industry ... See more keywords
Efficient TCAD Thermal Analysis of Semiconductor Devices
Sign Up to like & getrecommendations! Published in 2021 at "IEEE Transactions on Electron Devices"
DOI: 10.1109/ted.2021.3076753
Abstract: We present an efficient numerical technique for the temperature-dependent TCAD analysis of semiconductor devices. The approach is based on the linearization of the physical model around a nominal temperature operating condition, and exploits the Green’s… read more here.
Keywords: analysis semiconductor; thermal analysis; temperature; semiconductor devices ... See more keywords