Comparison between Ar+CH4 cathode and anode coupling chemical vapor depositions of hydrogenated amorphous carbon films
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DOI: 10.1016/j.tsf.2021.138701
Abstract: Abstract This research focuses on the comparison between cathode- and anode coupling deposition characteristics of hydrogenated amorphous carbon (a-C:H) using the capacitively coupled plasma (CCP) method. a-C:H films were fabricated by Ar+CH4 CCP chemical vapor… read more here.
Keywords: coupling process; cathode anode; anode coupling; cathode ... See more keywords